The SPACT NSF Research Experience for Undergraduates Site at SDSM&T, USD and SDSU, provides undergraduate students a chance to conduct cutting-edge research focused on security printing and anti-counterfeiting technology. Counterfeiting is a growing issue in the U.S., posing serious economic, safety and national security concerns. The REU program is a multi-disciplinary program with research opportunities in Materials Science and Engineering, Materials Chemistry, Electrical/Computer Engineering, Chemistry, and Computer Science.

Topical Research Areas:

  • Security Printing: Counterfeit Microelectronics
  • Development of Covert, High Capacity 2-D Bar Codes
  • Forensic Analysis of Native American Art
  • Anti-Counterfeiting Technology for Pharmaceutics
  • Security Ink Formulation
  • Synthesis of “Upconverting” Nanoparticles

The following hyperlink gives more details about the REU Site:

CLICK HERE TO SEE 2015 REU SITE FLYER

The following hyperlink shows the 2015 REU Site Application (deadline: 2/27/15):

CLICK HERE TO DOWNLOAD 2015 REU SITE APPLICATION